The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7579612 B1

PDF
Full Text
Expired
Date of Patent:
Aug. 25, 2009

Filed:

Apr. 25, 2007
Applicants:

Denny Tang, Saratoga, CA (US);

Tai-bor Wu, Hsinchu, TW;

Wen-yuan Chang, Taipei, TW;

Tzyh-cheang Lee, Hsinchu, TW;

Inventors:

Denny Tang, Saratoga, CA (US);

Tai-Bor Wu, Hsinchu, TW;

Wen-Yuan Chang, Taipei, TW;

Tzyh-Cheang Lee, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 47/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Disclosed herein are new resistive memory devices having one or more buffers layer surrounding a dielectric layer. By inserting one or more buffer layers around the dielectric layer of the device, the resistive ratio of the device is highly enhanced. For example, tests using this unique stack structure have revealed a resistance ratio of approximately 1000× over conventional electrode-dielectric-electrode stack structures found in resistive memory devices. This improvement in the resistance ratio of the resistive memory device is believed to be from the improved interface coherence, and thus smoother topography, between the buffer layer(s) and the dielectric layer.


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