The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2009
Filed:
Nov. 13, 2007
Masaru Takakura, Tokyo, JP;
Masaru Takakura, Tokyo, JP;
Jeol Ltd., Tokyo, JP;
Abstract
Method and apparatus for performing sample analysis using both the WDS and an energy-dispersive X-ray spectrometer (EDS). The analysis starts with irradiating the sample with an electron beam. Characteristic X-rays emanating from the sample are spectrally dispersed and detected by the WDS. The intensities of the characteristic X-rays at positions where the characteristic X-ray peaks are detected are measured. At this time, the background intensities of the characteristic X-rays at the positions where the characteristic X-ray peaks are detected are found based on a mean atomic number calculated using values which are derived by quantitative analysis based on the characteristic X-ray intensities measured by the EDS at the corresponding analysis positions on the sample. The background intensities are subtracted from the peak intensities at the positions where the characteristic X-ray peaks are detected by the WDS. Thus, the net characteristic X-ray intensities are found.