The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 25, 2009
Filed:
Sep. 24, 2004
Ikutaro Noji, Tokyo, JP;
Hozumi Yasuda, Tokyo, JP;
Takeshi Iizumi, Tokyo, JP;
Kazuto Hirokawa, Tokyo, JP;
Itsuki Kobata, Tokyo, JP;
Ikutaro Noji, Tokyo, JP;
Hozumi Yasuda, Tokyo, JP;
Takeshi Iizumi, Tokyo, JP;
Kazuto Hirokawa, Tokyo, JP;
Itsuki Kobata, Tokyo, JP;
Ebara Corporation, Tokyo, JP;
Abstract
An electrolytic processing apparatus can detect the end point of electrolytic processing stably with high precision and with a relatively simple construction. The electrolytic processing apparatus includes: a processing electrode which can come close to or into contact with a processing object; a feeding electrode for feeding electricity to the processing object; a fluid supply section for supplying fluid between the processing object and at least one of the processing electrode and the feeding electrode; a processing power source for applying a voltage between the processing electrode and the feeding electrode; a drive section for causing relative movement between the processing object and at least one of the processing electrode and the feeding electrode; and an eddy current sensor for detecting the thickness of the processing object from a change in eddy current loss. The sensor is disposed not in contact with (or separately) by an insulator from the processing electrode and/or the feeding electrode.