The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 18, 2009

Filed:

Mar. 18, 2008
Applicants:

Gary W. Behm, Hopewell Junction, NY (US);

Emily M. Hwang, Hopewell Junction, NY (US);

Yue J. LI, Hopewell Junction, NY (US);

Teresita Q. Magtoto, Poughkeepsie, NY (US);

Derek C. Stoll, Hopewell Junction, NY (US);

Inventors:

Gary W. Behm, Hopewell Junction, NY (US);

Emily M. Hwang, Hopewell Junction, NY (US);

Yue J. Li, Hopewell Junction, NY (US);

Teresita Q. Magtoto, Poughkeepsie, NY (US);

Derek C. Stoll, Hopewell Junction, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A computer program product and system of providing a dynamic sampling plan for integrated metrology is disclosed. The computer program product may include a computer readable medium that includes a computer readable program, wherein the computer readable program when executed on a computer causes the computer to: model a sampling plan for use with a factory level advanced processing control (FL-APC) system; receive a request for a sampling plan; and send a recommended sampling plan, based upon the request and the modeling. The recommended sampling plan may be sent to an equipment interface (EI) and on to a tool for implementation in a manufacturing environment.


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