The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 18, 2009
Filed:
May. 31, 2006
Steven J Radigan, Fremont, CA (US);
Usha Raghuram, San Jose, CA (US);
Samuel V Dunton, San Jose, CA (US);
Michael W Konevecki, San Jose, CA (US);
Steven J Radigan, Fremont, CA (US);
Usha Raghuram, San Jose, CA (US);
Samuel V Dunton, San Jose, CA (US);
Michael W Konevecki, San Jose, CA (US);
Sandisk 3D LLC, Milpitas, CA (US);
Abstract
A method is provided for forming patterned features using a conductive hard mask, where the conductive hard mask protects those features during a subsequent trench etch to form Damascene conductors providing electrical connection to those features from above. The thickness of the hard mask provides a margin to avoid overetch during the trench etch which may be harmful to device performance. The method is advantageously used in formation of a monolithic three dimensional memory array.