The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 04, 2009
Filed:
Jul. 26, 2006
Jun Hatakeyama, Joetsu, JP;
Yuji Harada, Joetsu, JP;
Yoshio Kawai, Joetsu, JP;
Masayuki Endo, Kadoma, JP;
Masaru Sasago, Kadoma, JP;
Haruhiko Komoriya, Kawagoe, JP;
Michitaka Ootani, Kawagoe, JP;
Satoru Miyazawa, Kawagoe, JP;
Kazuhiko Maeda, Tokyo, JP;
Jun Hatakeyama, Joetsu, JP;
Yuji Harada, Joetsu, JP;
Yoshio Kawai, Joetsu, JP;
Masayuki Endo, Kadoma, JP;
Masaru Sasago, Kadoma, JP;
Haruhiko Komoriya, Kawagoe, JP;
Michitaka Ootani, Kawagoe, JP;
Satoru Miyazawa, Kawagoe, JP;
Kazuhiko Maeda, Tokyo, JP;
Shin-Etsu Chemical Co., Ltd., Tokyo, JP;
Panasonic Corporation, Kadoma-Shi, JP;
Central Glass Co., Ltd., Ube-Shi, JP;
Abstract
A resist protective coating material is provided comprising an α-trifluoromethylacrylic acid/norbornene copolymer having cyclic perfluoroalkyl groups as pendant. In a pattern-forming process, the material forms on a resist film a protective coating which is water-insoluble, dissolvable in alkaline developer and immiscible with the resist film, allowing for effective implementation of immersion lithography.