The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2009
Filed:
May. 23, 2007
Alexander I. Ershov, San Diego, CA (US);
James J. Ferrell, Temecula, CA (US);
Thomas Hofmann, San Diego, CA (US);
Daniel J. Reiley, San Diego, CA (US);
Christopher R. Remen, San Diego, CA (US);
Richard L. Sandstrom, Encinitas, CA (US);
Alexander I. Ershov, San Diego, CA (US);
James J. Ferrell, Temecula, CA (US);
Thomas Hofmann, San Diego, CA (US);
Daniel J. Reiley, San Diego, CA (US);
Christopher R. Remen, San Diego, CA (US);
Richard L. Sandstrom, Encinitas, CA (US);
Cymer, Inc., San Diego, CA (US);
Abstract
An apparatus and method is disclosed which may comprise a high power excimer or molecular fluorine gas discharge laser DUV light source system which may comprise: a pulse stretcher which may comprise: an optical delay path mirror, an optical delay path mirror gas purging assembly which may comprise: a purging gas supply system directing purging gas across a face of the optical delay line mirror. The optical delay path mirror may comprise a plurality of optical delay path mirrors; the purging gas supply system may direct purging gas across a face of each of the plurality of optical delay line mirrors. The purging gas supply system may comprise: a purging gas supply line; a purging gas distributing and directing mechanism which may direct purging gas across the face of the respective optical delay path mirror.