The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 21, 2009

Filed:

Jul. 15, 2005
Applicants:

Shuji Fujiwara, Hashima, JP;

Tatsuhiko Koide, Gifu-ken, JP;

Inventors:

Shuji Fujiwara, Hashima, JP;

Tatsuhiko Koide, Gifu-ken, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/109 (2006.01);
U.S. Cl.
CPC ...
Abstract

A semiconductor device provided with an emitter layer having a narrowed base contact portion. The semiconductor device includes a collector layer arranged on a semiconductor substrate. A conductive layer is arranged on the collector layer. A silicon film is arranged on the conductive layer. An emitter electrode is arranged on the silicon film. A first film covers the side of the emitter electrode. The silicon film includes a first region contacting the emitter electrode and a second region differing from the first region. A contact surface between the first region and the emitter electrode is located at a level that is higher than that of the lower surface of the first film. At least part of the second region of the silicon film is located between the conductive layer and the first film and is in contact with the conductive layer and the first film.


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