The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2009
Filed:
Mar. 16, 2007
Sheung-hee Park, Pleasanton, CA (US);
Xuguang Wang, Sunnyvale, CA (US);
Wing Leung, Palo Alto, CA (US);
Ming-sang Kwan, San Leandro, CA (US);
Yi He, Fremont, CA (US);
Edward Franklin Runnion, Santa Clara, CA (US);
Sheung-Hee Park, Pleasanton, CA (US);
Xuguang Wang, Sunnyvale, CA (US);
Wing Leung, Palo Alto, CA (US);
Ming-Sang Kwan, San Leandro, CA (US);
Yi He, Fremont, CA (US);
Edward Franklin Runnion, Santa Clara, CA (US);
Spansion LLC, Sunnyvale, CA (US);
Abstract
Methods of erasing flash memory cells are provided that improve erase cycling speed and reliability. One embodiment comprises interactively applying a stepped or ramped drain voltage pattern to a drain of the memory cells and a pulsed gate voltage pattern to a gate of the memory cells for a predetermined number of gate pulses or until all the memory cells are erased. In another embodiment, an erase bias circuit is provided for erasing a sector of flash memory cells, the circuit comprising row and column decoders that selects wordline rows and columns of cells, respectively, a supply bias arrangement that provides source and drain supply voltages for the sector, and a patterned pulse bias arrangement configured to provide a pulsed gate voltage pattern to gates of the cells selected by the row decoder and a drain voltage pattern to the drains of the cells selected by the column decoder.