The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2009
Filed:
Mar. 29, 2004
Gustaaf Willem Van Der Feltz, 's-Hertogenbosch, NL;
Cheng-qun Gui, Best, NL;
Johan Christiaan Gerard Hoefnagels, Hooge Mierde, NL;
Gustaaf Willem Van Der Feltz, 's-Hertogenbosch, NL;
Cheng-Qun Gui, Best, NL;
Johan Christiaan Gerard Hoefnagels, Hooge Mierde, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus and method in which a patterning system is used to impart to a projection beam a pattern in its cross-section. The beam is directed by a projection system from an illumination system onto a target portion of the surface of a substrate supported on a substrate support. The target portion has predetermined spatial characteristics relative to the substrate table that are appropriate for a desired exposure pattern on the surface of the substrate. The temperature of the substrate is measured, and the dimensional response of the substrate to the measured temperature is calculated. The spatial characteristics of the target portion relative to the substrate table are adjusted to compensate for the calculated dimensional response.