The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2009
Filed:
Dec. 28, 2006
Keith E. Barton, Hyde Park, NY (US);
Steven H. Boettcher, Fishkill, NY (US);
John G. Gaudiello, Poughkeepsie, NY (US);
Leon J. Kimball, Montgomery, NY (US);
Yun-yu Wang, Poughquag, NY (US);
Keith E. Barton, Hyde Park, NY (US);
Steven H. Boettcher, Fishkill, NY (US);
John G. Gaudiello, Poughkeepsie, NY (US);
Leon J. Kimball, Montgomery, NY (US);
Yun-Yu Wang, Poughquag, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Dongbu Electronics Co., Ltd., , KR;
Abstract
A high quality electron microscopy sample suitable for electron holography is prepared by forming markers filled with TEOS oxide and by repeatedly applying multiple coats of an adhesive followed by a relatively low temperature cure after each application. The TEOS oxide marker is readily visible during the polish, has a similar polish rate as a semiconductor material, and reduces contamination during sample preparation. The repeated application of adhesives separated by relatively low temperature cures increases the adhesive strength of the adhesive material to the semiconductor material without making it too brittle. This results in an improved control and yield of the sample preparation process.