The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 14, 2009
Filed:
Aug. 30, 2006
Kangguo Cheng, Beacon, NY (US);
David M. Dobuzinsky, New Windsor, NY (US);
Xi LI, Somers, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Methods for enhancing trench capacitance and a trench capacitor so formed are disclosed. In one embodiment a method includes forming a first portion of a trench; depositing a dielectric layer in the first portion; performing a reactive ion etching including a first stage to etch the dielectric layer and form a micro-mask on a bottom surface of the first portion of the trench and a second stage to form a second portion of the trench having a rough sidewall; depositing a node dielectric; and filling the trench with a conductor. The rough sidewall enhances trench capacitance without increasing processing complexity or cost.