The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2009
Filed:
Dec. 08, 2005
Carolus Johannes Catharina Schoormans, Hoge-Mierde, NL;
Emiel Jozef Melanie Eussen, Eindhoven, NL;
Willem Herman Gertruda Anna Koenen, Roermond, NL;
Nicolas Alban Lallemant, Veldhoven, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Johannes Mathias Theodorus Antonius Adriaens, Eindhoven, NL;
Carolus Johannes Catharina Schoormans, Hoge-Mierde, NL;
Emiel Jozef Melanie Eussen, Eindhoven, NL;
Willem Herman Gertruda Anna Koenen, Roermond, NL;
Nicolas Alban Lallemant, Veldhoven, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Johannes Mathias Theodorus Antonius Adriaens, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A device manufacturing method includes projecting a patterned beam of radiation onto a substrate, wherein the position of a movable object is determined in a number of degrees of freedom using a number of sensors, the number of sensors being larger than the number of degrees of freedom, wherein the position of the movable object in the number of degrees of freedom is determined using signals of each of the sensors, wherein the signals of the sensors are weighed on the basis of the difference between noise levels of each of the sensors. Accuracy of the position measurement of movable object and/or overlay and focus performance are improved in lithographic apparatus.