The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2009
Filed:
Nov. 01, 2005
Dominicus Jacobus Petrus A. Franken, Veldhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Pertrus Rutgerus Bartray, Ijsselsteijn, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Michael Jozef Mathijs Renkens, Sittard, NL;
Gerard Van Schothorst, Hedel, NL;
Johan Juliana Dries, Aerendonk, BE;
Dominicus Jacobus Petrus A. Franken, Veldhoven, NL;
Erik Roelof Loopstra, Heeze, NL;
Pertrus Rutgerus Bartray, Ijsselsteijn, NL;
Marc Wilhelmus Maria Van Der Wijst, Veldhoven, NL;
Michael Jozef Mathijs Renkens, Sittard, NL;
Gerard Van Schothorst, Hedel, NL;
Johan Juliana Dries, Aerendonk, BE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a projection system mounted on a reference frame, which in turn is mounted on a base which supports the apparatus. Vibrations and displacement errors in the base are filtered through two sets of isolation mounts operatively between the base and reference frame and between the reference frame and a projection frame of the projection system and therefore disturbance of the projection system is reduced.