The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 30, 2009
Filed:
Jan. 18, 2006
Applicants:
Sheng-hui Hsieh, Taipei, TW;
Ling-wuu Yang, Hsinchu, TW;
Chi-tung Huang, Hsinchu, TW;
Kuang-chao Chen, Hsinchu, TW;
Inventors:
Sheng-Hui Hsieh, Taipei, TW;
Ling-Wuu Yang, Hsinchu, TW;
Chi-Tung Huang, Hsinchu, TW;
Kuang-Chao Chen, Hsinchu, TW;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/4763 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for symmetric deposition of metal layer over a metal layer registration key comprises using MOCVD to form the metal layer. Once the symmetric metal layer is formed, a metal layer registration key can be accurately detected and the metal layer registration key overlay shift can be improved.