The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 23, 2009

Filed:

Mar. 21, 2006
Applicants:

Johannes Rau, Gerstetten, DE;

Josef Distl, Oberkochen, DE;

Armin Schoeppach, Aalen, DE;

Hubert Holderer, Oberkochen, DE;

Inventors:

Johannes Rau, Gerstetten, DE;

Josef Distl, Oberkochen, DE;

Armin Schoeppach, Aalen, DE;

Hubert Holderer, Oberkochen, DE;

Assignee:

Carl Zeiss SMT AG, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 7/02 (2006.01);
U.S. Cl.
CPC ...
Abstract

The invention relates to processes for connecting an optical element of a microlithographic projection exposure apparatus to a mount, and also relates to an assembly. A process includes the following steps: forming a substance mixture at a processing temperature from at least a first component, which is solid at the processing temperature, and a second component, which is liquid at the processing temperature, the first component being dispersed in the second component, introducing the substance mixture in the unset state between the optical element and the mount, and setting the substance mixture so as to form a diffusion alloy from the first and second components.


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