The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 23, 2009
Filed:
Mar. 02, 2005
Takashi Kaito, Chiba, JP;
Takashi Kaito, Chiba, JP;
SII NanoTechnology Inc., , JP;
Abstract
A preliminary processing technology for a sample locally cuts out a sample part of a device to be analyzed and processes it into a needle-like projection, and a technology of realizing SAP analysis on an atomic level by ensuring stabilized ion evaporation sequentially even in the case of a sample of multilayer structure including an element layer of small evaporation electric field. The preliminary processing method for a sample used on atom probe apparatus comprises a step for cutting the desired observing part of the sample into a block using an FIB equipment, a step for transferring the sample block onto a sample substrate and fixing the sample block in place, and a step for processing the sample block fixed onto the sample substrate into a needle-point shape by FIB etching. The sample processed into a needle-point shape is shaped such that the layer direction of the multilayer structure becomes parallel to the longitudinal direction of the needle.