The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 09, 2009
Filed:
Oct. 17, 2007
Chi-pin LU, Hsinchu, TW;
Ling-wu Yang, Hsinchu, TW;
Chi-Pin Lu, Hsinchu, TW;
Ling-Wu Yang, Hsinchu, TW;
MACRONIX International Co., Ltd., Hsinchu, TW;
Abstract
A method of forming word lines of a memory includes providing a substrate and forming a conductive layer on the substrate. A metal silicide layer is formed on the conductive layer, and a mask pattern is formed on the metal silicide layer. A mask liner covering the mask pattern and the surface of the metal silicide layer is formed on the substrate to shorten distances between the word line regions. An etching process is performed on the mask liner and the mask pattern until the partial surface of the metal silicide layer is exposed. The metal silicide layer and the conductive layer are etched to form word lines by utilizing the mask liner and the mask pattern as a mask. A silicon content of the metal silicide layer must be less than or equal to 2 for reducing a bridge failure rate between the word lines.