The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 26, 2009

Filed:

Dec. 19, 2005
Applicants:

Wei-ning Shen, Cupertino, CA (US);

Xinkang Tian, San Jose, CA (US);

Byeong Su Hwang, San Jose, CA (US);

Tuan Van Tran, San Jose, CA (US);

Inventors:

Wei-Ning Shen, Cupertino, CA (US);

Xinkang Tian, San Jose, CA (US);

Byeong Su Hwang, San Jose, CA (US);

Tuan Van Tran, San Jose, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01J 1/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

Calibration of pattern recognition in bright field imaging systems is disclosed. A target pattern on a substrate on the stage is brought into focus of a bright field system. The image is scanned in a first direction while measuring an edge scattering pattern from a feature of the target pattern. The edge scattering pattern is characterized by first and second peaks. A position of the bright field system's illuminator or beam shaping and relay optics is adjusted perpendicular to an optical path until the first and second peaks are approximately equal in height.


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