The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 26, 2009
Filed:
Apr. 27, 2000
Akira Koshiishi, Kofu, JP;
Keizo Hirose, Nirasaki, JP;
Akira Koshiishi, Kofu, JP;
Keizo Hirose, Nirasaki, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
In the plasma processing apparatus of the present invention, a first electrode () for connecting a high frequency electric power source () in a chamber is arranged to be opposed to a second electrode (). A substrate (W) to be processed is placed between the electrodes. There is provided a harmonic absorbing member () for being able to absorb harmonics of the high frequency electric power source () so as to come in contact with a peripheral portion or circumference of a face of the first electrode, which is opposite the second electrode (). The harmonic absorbing member absorbs the reflected harmonic before the harmonic returns to the high frequency electric power source. By absorbing the harmonic in this manner, the standing wave due to the harmonic will be effectively prevented from being generated, and the density of plasma is made even.