The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2009

Filed:

Jul. 14, 2005
Applicants:

Alexandre Ellison, Linköping, SE;

Christer Hallin, Herndon, VA (US);

Björn Magnusson, Linköping, SE;

Peder Bergman, Linköping, SE;

Inventors:

Alexandre Ellison, Linköping, SE;

Christer Hallin, Herndon, VA (US);

Björn Magnusson, Linköping, SE;

Peder Bergman, Linköping, SE;

Assignee:

Norstel AB, Norrköping, SE;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method for producing, on an SiC substrate, SiC homoepitaxial layers of the same polytype as the substrate. The layers are grown on a surface of the SiC substrate, wherein the surface is inclined relative to the (0001) basal plane at an angle higher than 0.1 degree but less than 1 degree. An homoepitaxial growth is started by forming a boundary layer with a thickness up to 1 μm.


Find Patent Forward Citations

Ellison, Alexandre. (2009). Homoepitaxial growth of sic on low off-axis sic wafers (U.S. Patent No. 7531433). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7531433

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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