The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2009
Filed:
May. 22, 2007
David Chen, San Jose, CA (US);
Andrew Steinbach, Menlo Park, CA (US);
Daniel Kavaldjiev, Milpitas, CA (US);
Alexander Belyaev, Mountain View, CA (US);
Juergen Reich, Campbell, CA (US);
David Chen, San Jose, CA (US);
Andrew Steinbach, Menlo Park, CA (US);
Daniel Kavaldjiev, Milpitas, CA (US);
Alexander Belyaev, Mountain View, CA (US);
Juergen Reich, Campbell, CA (US);
KLA-Tencor Technologies Corporation, Milpitas, CA (US);
Abstract
Methods and systems for detecting pinholes in a film formed on a wafer or for monitoring a thermal process tool are provided. One method for detecting pinholes in a film formed on a wafer includes generating output responsive to light from the wafer using an inspection system. The output includes first output corresponding to defects on the wafer and second output that does not correspond to the defects. This method also includes detecting the pinholes in the film formed on the wafer using the second output. One method for monitoring a thermal process tool includes generating output responsive to light from a wafer using an inspection system. The output includes the first and second output described above. The wafer was processed by the thermal process tool prior to generating the output. The method also includes monitoring the thermal process tool using the second output.