The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2009
Filed:
Dec. 07, 2005
Richard C. Zimmerman, Brookfield, CT (US);
Eric B. Catey, Danbury, CT (US);
David A. Hult, Danbury, CT (US);
Alexander C. Kremer, Stamford, CT (US);
Heine Melle Mulder, Veldhoven, NL;
Hendrikus Robertus Marie Van Greevenbroek, Eindhoven, NL;
Roberto B. Wiener, Eindhoven, NL;
Richard C. Zimmerman, Brookfield, CT (US);
Eric B. Catey, Danbury, CT (US);
David A. Hult, Danbury, CT (US);
Alexander C. Kremer, Stamford, CT (US);
Heine Melle Mulder, Veldhoven, NL;
Hendrikus Robertus Marie Van Greevenbroek, Eindhoven, NL;
Roberto B. Wiener, Eindhoven, NL;
ASML Holding N.V., Veldhoven, NL;
Abstract
A system and method for uniformity correction is provided. The system includes a plurality of winged correction elements inserted into the illumination field in a defined configuration. Adjacent winged correction elements are overlapped to minimize induced uniformity ripple. Each winged correction element has a first protrusion on a longitudinal edge of the correction element and a second protrusion on the opposite longitudinal edge. The slope of a sloped edge of the first protrusion and the slope of a sloped edge of the second protrusion are tied to the slope of a gradient in the non-uniformity profile of the illumination field. In addition, the angles defined by the flat tip of the correction element and the sloped edge of the first and second protrusions are tied to the angle of a gradient of the illumination field.