The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2009
Filed:
Oct. 13, 2005
Applicants:
Atul Gupta, Waltham, MA (US);
Vikram Singh, North Andover, MA (US);
Timothy Miller, South Hamilton, MA (US);
Edmund Jacques Winder, Waltham, MA (US);
Inventors:
Atul Gupta, Waltham, MA (US);
Vikram Singh, North Andover, MA (US);
Timothy Miller, South Hamilton, MA (US);
Edmund Jacques Winder, Waltham, MA (US);
Assignee:
Varian Semiconductor Equipment Associates, Inc., Gloucester, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/423 (2006.01); H01L 21/425 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method of doping includes depositing a layer of dopant material on nonplanar and planar features of a substrate. Inert ions are generated from an inert feed gas. The inert ions are extracted towards the substrate where they physically knock the dopant material into both the planar and nonplanar features of the substrate.