The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2009
Filed:
Feb. 19, 2008
Toru Tojo, Naka-gun, JP;
Toshiyuki Watanabe, Yokohama, JP;
Ikunao Isomura, Yokohama, JP;
Akihiko Sekine, Tokyo, JP;
Toru Tojo, Naka-gun, JP;
Toshiyuki Watanabe, Yokohama, JP;
Ikunao Isomura, Yokohama, JP;
Akihiko Sekine, Tokyo, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Kabushiki Kaisha Topcon, Tokyo, JP;
Abstract
A pattern inspection apparatus comprises an illumination optics applying a first inspection light on a predetermined wavelength to a surface opposite to a pattern formed surface of the substrate, and a second inspection light whose wavelength is equal to the wavelength of the first inspection light to the pattern formed surface, a detector independently detecting a transmitted light from the substrate by irradiation of the first inspection light and a reflected light from the substrate by irradiation of the second inspection light, and a space separation mechanism provided in the vicinity of an optical focal plane toward the pattern formed surface, and spatially separates an irradiation area of the first and second inspection lights such that the transmitted and reflected lights from the substrate are imaged in two discrete areas separated on the optical focal plane.