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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7517816 B1

PDFFull Text
Date of Patent:
Apr. 14, 2009

Filed:

Feb. 15, 2005

Technique for creating different mechanical stress in different channel regions by forming an etch stop layer having differently modified intrinsic stress

Applicants:

Kai Frohberg, Meissen, DE;

Matthias Schaller, Dresden, DE;

Massud Aminpur, Dresden, DE;

Inventors:

Kai Frohberg, Meissen, DE;

Matthias Schaller, Dresden, DE;

Massud Aminpur, Dresden, DE;

Assignee:

Advanced Micro Devices, Inc., Austin, TX (US);

Attorney:

Williams, Morgan & Amerson, P.C.

Primary Examiner:

M Wilczewski

Assistant Examiner:

Daniel Luke

Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01L 21/469 (2006.01); H01L 21/8238 (2006.01);
U.S. Cl.
CPC ...
Abstract

By providing a contact etch stop layer, the stress in channel regions of different transistor types may be effectively controlled, wherein tensile and compressive stress portions of the contact etch stop layer may be obtained by well-established processes, such as wet chemical etch, plasma etch, ion implantation, plasma treatment and the like. Hence, a significant improvement in transistor performance may be obtained while not significantly contributing to process complexity.

Find Patent Forward Citations

Frohberg, Kai. (2009). Technique for creating different mechanical stress in different channel regions by forming an etch stop layer having differently modified intrinsic stress (U.S. Patent No. 7517816). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7517816

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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