The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 14, 2009
Filed:
Mar. 30, 2005
Applicants:
Cory S. Wajda, Sand Lake, NY (US);
Kristen Scheer, Milton, NY (US);
Toshihara Furakawa, Essex Junction, VT (US);
Inventors:
Cory S. Wajda, Sand Lake, NY (US);
Kristen Scheer, Milton, NY (US);
Toshihara Furakawa, Essex Junction, VT (US);
Assignees:
Tokyo Electron, Ltd., Tokyo, JP;
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/33 (2006.01);
U.S. Cl.
CPC ...
Abstract
A method for preparing an oxynitride film on a substrate comprising forming the oxynitride film by exposing a surface of the substrate to oxygen radicals and nitrogen radicals formed by plasma induced dissociation of a process gas comprising nitrogen and oxygen using plasma based on microwave irradiation via a plane antenna member having a plurality of slits.