The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 31, 2009
Filed:
Feb. 05, 2008
Franciscus Van DE Mast, Eindhoven, NL;
Johan Christiaan Gerard Hoefnagels, Hooge Mierde, NL;
Johannes Onvlee, s-Hertogenbosch, NL;
Reinder Teun Plug, Eindhoven, NL;
Franciscus Van De Mast, Eindhoven, NL;
Johan Christiaan Gerard Hoefnagels, Hooge Mierde, NL;
Johannes Onvlee, s-Hertogenbosch, NL;
Reinder Teun Plug, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithography system in which a performance criterion of the lithography system is predicted, based on one or more operating conditions of the lithography system, and compared to measurements of that performance criterion. The lithography system may determine from a difference between the measured and predicted performance criterion which, if any, sub-system of the lithography system is not performing as expected.