The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 24, 2009
Filed:
Aug. 09, 2004
Kyle Y. Flanigan, Portland, OR (US);
Juan E. Dominguez, Hillsboro, OR (US);
Sergei V. Koveshnikov, Hillsboro, OR (US);
Ernisse Putna, Beaverton, OR (US);
Kyle Y. Flanigan, Portland, OR (US);
Juan E. Dominguez, Hillsboro, OR (US);
Sergei V. Koveshnikov, Hillsboro, OR (US);
Ernisse Putna, Beaverton, OR (US);
Intel Corporation, Santa Clara, CA (US);
Abstract
An optically tuned SLAM (Sacrificial Light-Absorbing Material) may be used in a via-first dual damascene patterning process to facilitate removal of the SLAM. The monomers used to produce the optically tuned SLAM may be modified to place an optically sensitive structure in the backbone of the SLAM polymer. The wafer may be exposed to a wavelength to which the SLAM is tuned prior to etching and/or ashing steps to degrade the optically tuned SLAM and facilitate removal.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile