The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 17, 2009
Filed:
Aug. 13, 2005
Abdurrahman Sezginer, Los Gatos, CA (US);
Roy Prasad, Los Gatos, CA (US);
Abdurrahman Sezginer, Los Gatos, CA (US);
Roy Prasad, Los Gatos, CA (US);
Cadence Design Systems, Inc., San Jose, CA (US);
Abstract
A method of modifying polygons in a data set mask-less or mask based optical projection lithography includes: 1) mapping the data set to a figure-of-demerit; 2) moving individual polygon edges to decrease the figure-of-demerit; and 3) disrupting the set of polygons to enable a further decrease in the figure-of-demerit, wherein disrupting polygons includes any of the following polygon disruptions: breaking up, merging, or deleting polygons.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile