The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 10, 2009
Filed:
Feb. 19, 2008
Steven G. Barbee, Dover Plains, NY (US);
Jeong W. Nam, Poughquag, NY (US);
Viorel Ontalus, Danbury, CT (US);
Yuusheng Song, Poughkeepsie, NY (US);
Steven G. Barbee, Dover Plains, NY (US);
Jeong W. Nam, Poughquag, NY (US);
Viorel Ontalus, Danbury, CT (US);
Yuusheng Song, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An exemplary method for performing fabrication sequence analysis, the method comprising, defining a process group, wherein a process group includes fabrication processes in a fabrication sequence, determining fabrication process paths in the process group to define independent variables, wherein a process path is a plurality of fabrication equipment used to fabricate a particular semiconductor device in the fabrication sequence, receiving a dependent variable for the fabrication sequence, performing analysis of variance to calculate a p-value for the process group, determining whether the p-value is lower than a threshold value, identifying a poor process path responsive to determining that the p-value is lower than a threshold value, and outputting the identified poor process path.