The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 10, 2009

Filed:

Feb. 15, 2005
Applicants:

William M. Holber, Winchester, MA (US);

Xing Chen, Lexington, MA (US);

Andrew B. Cowe, Andover, MA (US);

Matthew M. Besen, Andover, MA (US);

Ronald W. Collins, Jr., Derry, NH (US);

Susan C. Trulli, Lexington, MA (US);

Shouqian Shao, Winchester, MA (US);

Inventors:

William M. Holber, Winchester, MA (US);

Xing Chen, Lexington, MA (US);

Andrew B. Cowe, Andover, MA (US);

Matthew M. Besen, Andover, MA (US);

Ronald W. Collins, Jr., Derry, NH (US);

Susan C. Trulli, Lexington, MA (US);

Shouqian Shao, Winchester, MA (US);

Assignee:

MKS Instruments, Inc., Andover, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 10/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

Plasma ignition and cooling apparatus and methods for plasma systems are described. An apparatus can include a vessel and at least one ignition electrode adjacent to the vessel. A total length of a dimension of the at least one ignition electrode is greater than 10% of a length of the vessel's channel. The apparatus can include a dielectric toroidal vessel, a heat sink having multiple segments urged toward the vessel by a spring-loaded mechanism, and a thermal interface between the vessel and the heat sink. A method can include providing a gas having a flow rate and a pressure and directing a portion of the flow rate of the gas into a vessel channel. The gas is ignited in the channel while the remaining portion of the flow rate is directed away from the channel.


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