The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 24, 2009
Filed:
Nov. 26, 2007
Applicants:
Anthony J. Lochtefeld, Ipswich, MA (US);
Christopher Leitz, Manchester, NH (US);
Matthew T. Currie, Boston, MA (US);
Mayank T. Bulsara, Cambridge, MA (US);
Inventors:
Anthony J. Lochtefeld, Ipswich, MA (US);
Christopher Leitz, Manchester, NH (US);
Matthew T. Currie, Boston, MA (US);
Mayank T. Bulsara, Cambridge, MA (US);
Assignee:
AmberWave Systems Corporation, Salem, NH (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract
Misfit dislocations are selectively placed in layers formed over substrates. Thicknesses of layers may be used to define distances between misfit dislocations and surfaces of layers formed over substrates, as well as placement of misfit dislocations and dislocation arrays with respect to devices subsequently formed on the layers.