The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 24, 2009

Filed:

Apr. 21, 2006
Applicants:

Himanshu Pokharna, San Jose, CA (US);

Phong Le, Fremont, CA (US);

Srinivas D. Nemani, San Jose, CA (US);

Inventors:

Himanshu Pokharna, San Jose, CA (US);

Phong Le, Fremont, CA (US);

Srinivas D. Nemani, San Jose, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F01N 3/08 (2006.01);
U.S. Cl.
CPC ...
Abstract

Method and apparatus for abating Ffrom by-products generated during cleaning of a processing chamber. Fabatement is efficiently performed by directly injecting Hin line with a foreline exiting the processing chamber. A tube which is highly resistant to oxidation and corrosive gases, even at high temperature, is connected in line with the foreline as part of the exhaust line of the processing chamber. A cooling jacket may be provided for cooling the tube, since the reaction between Fand His exothermic. A pressure monitoring arrangement may also be employed to insure that pressure within a hydrogen line, that feeds the injection of Hinto the tube, does not exceed a predetermined pressure value.


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