The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 10, 2009

Filed:

Apr. 01, 2008
Applicants:

Takeshi Iwai, Kawasaki, JP;

Hideo Hada, Kawasaki, JP;

Masaru Takeshita, Kawasaki, JP;

Akiya Kawaue, Kawasaki, JP;

Keita Ishiduka, Kawasaki, JP;

Hiroaki Shimizu, Kawasaki, JP;

Kyoko Ohshita, Kawasaki, JP;

Tsuyoshi Nakamura, Kawasaki, JP;

Komei Hirahara, Kawasaki, JP;

Yuichi Suzuki, Kawasaki, JP;

Takehiro Seshimo, Kawasaki, JP;

Kensuke Matsuzawa, Kawasaki, JP;

Inventors:

Takeshi Iwai, Kawasaki, JP;

Hideo Hada, Kawasaki, JP;

Masaru Takeshita, Kawasaki, JP;

Akiya Kawaue, Kawasaki, JP;

Keita Ishiduka, Kawasaki, JP;

Hiroaki Shimizu, Kawasaki, JP;

Kyoko Ohshita, Kawasaki, JP;

Tsuyoshi Nakamura, Kawasaki, JP;

Komei Hirahara, Kawasaki, JP;

Yuichi Suzuki, Kawasaki, JP;

Takehiro Seshimo, Kawasaki, JP;

Kensuke Matsuzawa, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki-shi, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/30 (2006.01); C07D 333/46 (2006.01);
U.S. Cl.
CPC ...
Abstract

A resist composition including a base component (A) and an acid-generator component (B), the acid-generator component (B) including an acid generator (B1) including a compound represented by general formula (b1-8) shown below (wherein Rrepresents an acid dissociable, dissolution inhibiting group; Rto Reach independently represents a halogen atom, a halogenated alkyl group, an alkyl group, an acetyl group, an alkoxy group, a carboxy group or a hydroxyalkyl group; Q represents a divalent linking group or a single bond; and Xrepresents an anion) or an acid generator (B1') including a compound represented by general formula (b1-9) shown below (wherein Rand Reach independently represents a hydrogen atom, an alkyl group or a halogenated alkyl group; Rrepresents an alkyl group or a halogenated alkyl group, wherein Rand Rmay be bonded to each other to form a ring structure; and Xrepresents an anion).


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