The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 03, 2009
Filed:
Mar. 31, 2004
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Edwin Johan Buis, Belfeld, NL;
Sjoerd Nicolaas Lambertus Donders, 'S-Hertogenbosch, NL;
Jan Van Elp, Delft, NL;
Jan Frederik Hoogkamp, Breda, NL;
Aschwin Lodewijk Hendricus Johannes Van Meer, Roosendaal, NL;
Patrick Johannes Cornelus Hendrik Smulders, Best, NL;
Franciscus Andreas Cornelis Johannes Spanjers, Oirschot, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Valkenswaard, NL;
Raimond Visser, Best, NL;
Henricus Gerardus Tegenbosch, Eindhoven, NL;
Johannes Charles Adrianus Van Den Berg, Eindhoven, NL;
Henricus Johannes Adrianus Van DE Sande, Geldrop, NL;
Thijs Vervoort, Eindhoven, NL;
Patricius Aloysius Jacobus Tinnemans, Hapert, NL;
Edwin Johan Buis, Belfeld, NL;
Sjoerd Nicolaas Lambertus Donders, 'S-Hertogenbosch, NL;
Jan Van Elp, Delft, NL;
Jan Frederik Hoogkamp, Breda, NL;
Aschwin Lodewijk Hendricus Johannes Van Meer, Roosendaal, NL;
Patrick Johannes Cornelus Hendrik Smulders, Best, NL;
Franciscus Andreas Cornelis Johannes Spanjers, Oirschot, NL;
Johannes Petrus Martinus Bernardus Vermeulen, Valkenswaard, NL;
Raimond Visser, Best, NL;
Henricus Gerardus Tegenbosch, Eindhoven, NL;
Johannes Charles Adrianus Van Den Berg, Eindhoven, NL;
Henricus Johannes Adrianus Van De Sande, Geldrop, NL;
Thijs Vervoort, Eindhoven, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.