The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 27, 2009
Filed:
Dec. 09, 2005
Soichi Owa, Kumagaya, JP;
Nobutaka Magome, Kumagaya, JP;
Shigeru Hirukawa, Tokyo, JP;
Yoshihiko Kudo, Tokyo, JP;
Jiro Inoue, Kumagaya, JP;
Hiroyuki Nagasaka, Kumagaya, JP;
Soichi Owa, Kumagaya, JP;
Nobutaka Magome, Kumagaya, JP;
Shigeru Hirukawa, Tokyo, JP;
Yoshihiko Kudo, Tokyo, JP;
Jiro Inoue, Kumagaya, JP;
Hiroyuki Nagasaka, Kumagaya, JP;
Nikon Corporation, Tokyo, JP;
Abstract
In exposing substrate by projecting an image of a pattern onto substrate via projection optical system and liquid, side surface and underside surface of substrate are applied with liquid-repellent treatment. By such a configuration, an exposure method by which when exposing edge areas of the substrate, the exposure can be performed in a condition that a liquid immersion region is formed well and that flowing out of the liquid to the outside of the substrate stage are prevented is provided.