The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 27, 2009

Filed:

Sep. 18, 2006
Applicants:

Udo Dinger, Oberkochen, DE;

Frank Eisert, Aalen, DE;

Siegfried Stacklies, Abtsgmuend, DE;

Martin Weiser, Sinsheim, DE;

Guenther Seitz, Spiegelberg, DE;

Inventors:

Udo Dinger, Oberkochen, DE;

Frank Eisert, Aalen, DE;

Siegfried Stacklies, Abtsgmuend, DE;

Martin Weiser, Sinsheim, DE;

Guenther Seitz, Spiegelberg, DE;

Assignee:

Carl Zeiss SMT AG, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 5/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A mirror for use in a projection exposure apparatus is described. The mirror has a main surface extending beyond an outline of an optical surface of the main surface. The optical surface has a roughness of less than 1 nm rms, and the outline of the optical surface includes a portion where the main surface extends beyond the optical surface by less than 0.2 mm. Manufacturing the mirror may involve polishing the optical surface in regions of the main surface extending beyond the optical surface and removing material of the substrate carrying a portion of the surface extending beyond the optical surface.


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