The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2009
Filed:
Nov. 24, 2004
Emiel Jozef Melanie Eussen, Eindhoven, NL;
Marcel Hendrikus Maria Beems, Veldhoven, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
Emiel Jozef Melanie Eussen, Eindhoven, NL;
Marcel Hendrikus Maria Beems, Veldhoven, NL;
Engelbertus Antonius Fransiscus Van Der Pasch, Oirschot, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
An improved lithographic interferometer system, is presented herein. The lithographic interferometer system comprises a beam generating mechanism, mirrors which reflect those beams, and detection devices for detecting an interference pattern of overlapping reflected beams. The beam generating mechanism comprises a beam-splitter, which splits the beams into reference beams and measuring beams, a reference mirror that provides a plane mirror interferometer, and a reflective surface that emits at least one reference beam used in a differential plane mirror interferometer.