The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 06, 2009
Filed:
Oct. 01, 2007
Harry David Cox, Rifton, NY (US);
Hsichang Liu, Fishkill, NY (US);
Nike Oluwakemi Medahunsi, Beacon, NY (US);
Krystyna Waleria Semkow, Poughquag, NY (US);
Harry David Cox, Rifton, NY (US);
Hsichang Liu, Fishkill, NY (US);
Nike Oluwakemi Medahunsi, Beacon, NY (US);
Krystyna Waleria Semkow, Poughquag, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A structure. The structure includes a layered configuration including a copper layer, a first layer, and a second layer. The first and second layers are disposed on opposite sides of the copper layer and are in direct mechanical contact with the copper layer. The first and second layers each include a same alloy of nickel and a metal consisting of cobalt, iron, copper, manganese, or molybdenum. A first region in the first layer extends completely through the first layer. A second region in the second layer extends completely through the second layer. A third region in the first layer extends completely through the first layer. The third region does not extend into any portion of the second layer. The first, second region, and third regions each include a photoresist or an opening such that photoresist or opening extends completely through the first, second, and first layer, respectively.