The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Dec. 30, 2008

Filed:

Oct. 28, 2005
Applicants:

Palash P. Das, Vista, CA (US);

Albert P. Cefalo, San Diego, CA (US);

David S. Knowles, San Diego, CA (US);

Vitaliy Shklover, Koenigsbronn, DE;

Holger Muenz, Aalen, DE;

Inventors:

Palash P. Das, Vista, CA (US);

Albert P. Cefalo, San Diego, CA (US);

David S. Knowles, San Diego, CA (US);

Vitaliy Shklover, Koenigsbronn, DE;

Holger Muenz, Aalen, DE;

Assignee:

Cymer, Inc., San Diego, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G02B 27/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

Systems and methods are disclosed for shaping a laser beam for interaction with a film in which the laser beam travels along a beam path and defines a short-axis and a long-axis. In one aspect, the system may include a first short-axis element having an edge positioned at a distance, d, along the beam path from the film and a second short-axis element having an edge positioned at a distance, d, along the beam path from the film, with d<d. An optic may be positioned along the beam path between the second element and the film for focusing the beam in the short-axis for interaction with the film. In another aspect, a system may be provided having a mechanism operative to selectively adjust the curvature of one or both of the edges of the short-axis element.


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