The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 30, 2008
Filed:
Jan. 21, 2005
Applicants:
Yi-lung Cheng, Danshuei Township, Taipei County, TW;
Hong-jui Chang, Sheton Shiang, TW;
Ying-lang Wang, Longjing Township, Taichung County, TW;
Inventors:
Yi-Lung Cheng, Danshuei Township, Taipei County, TW;
Hong-Jui Chang, Sheton Shiang, TW;
Ying-Lang Wang, Longjing Township, Taichung County, TW;
Assignee:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/31 (2006.01); H01L 21/469 (2006.01); H01L 21/8242 (2006.01);
U.S. Cl.
CPC ...
Abstract
A TEOS deposition method. A mixture of gases is introduced into a process chamber, in which the mixture of gases comprises tetra-ethyl-ortho-silicate (TEOS) and N. Compressive stress of a TEOS oxide film is increased by activating the mixture of gases.