The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 23, 2008
Filed:
Dec. 28, 2005
Derk Jan Wilfred Klunder, Geldrop, NL;
Levinus Pieter Bakker, Helmond, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Frank Jeroen Pieter Schuurmans, Valkenswaard, NL;
Dominik Vaudrevange, Aachen, DE;
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
Derk Jan Wilfred Klunder, Geldrop, NL;
Levinus Pieter Bakker, Helmond, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Frank Jeroen Pieter Schuurmans, Valkenswaard, NL;
Dominik Vaudrevange, Aachen, DE;
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a radiation system for providing a beam of radiation. The radiation system includes at least one of a contaminant trap for trapping material emanating from the radiation source and a collector for collecting the beam of radiation. The at least one of the contaminant trap and the collector includes an element arranged in the path of the radiation beam on which the material emanating from the radiation source can deposit during propagation of the radiation beam in the radiation system. At least a part of the element disposed in the path of the radiation beam has a surface that has a highly specular grazing incidence reflectivity to reduce the absorption of the radiation beam in a direction of propagation of the radiation beam substantially non-parallel to the surface of the element, so that a thermal load experienced by the element is reduced.