The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2008
Filed:
Dec. 08, 2005
Vadim Yevgenyevich Banine, Helmond, NL;
Sonia Margart Skelly, Veldhoven, NL;
Derk Jan Wilfred Klunder, Geldrop, NL;
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
Vadim Yevgenyevich Banine, Helmond, NL;
Sonia Margart Skelly, Veldhoven, NL;
Derk Jan Wilfred Klunder, Geldrop, NL;
Maarten Marinus Johannes Wilhelmus Van Herpen, Heesch, NL;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes a collector configured to collect radiation from a radiation source, the collector including a plurality of shells forming separate compartments, and a cleaning arrangement including a gas inlet and a gas outlet, the cleaning arrangement being configured to clean surfaces of the plurality of shells by guiding a gas flow from the inlet through the compartments to the outlet. The cleaning arrangement includes a distribution system configured to divide the gas flow into several sub flows, each of the sub flows corresponding to one or more of the compartments, and a control system configured to control the relative amount of the sub flows.