The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 16, 2008
Filed:
May. 18, 2006
James P. Garcia, Santa Clara, CA (US);
Mike Ravkin, Sunnyvale, CA (US);
Carl Woods, Aptos, CA (US);
Fred C. Redeker, Fremont, CA (US);
John DE Larios, Palo Alto, CA (US);
James P. Garcia, Santa Clara, CA (US);
Mike Ravkin, Sunnyvale, CA (US);
Carl Woods, Aptos, CA (US);
Fred C. Redeker, Fremont, CA (US);
John de Larios, Palo Alto, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
A substrate preparation apparatus is provided. The apparatus includes a housing configured to be installed in a substrate fabrication facility. The housing includes a manifold for use in preparing a wafer surface. The manifold is configured to include a first process window in a first portion of the manifold. A first fluid meniscus is capable of being defined within the first process windowl. Further included is a second process window in a second portion of the manifold. A second fluid meniscus is capable of being defined within the second process window. An arm is integrated with the housing, and the arm is coupled to the manifold, such that the arm is capable of positioning the manifold in proximity with the substrate during operation. The apparatus therefore provides for the formation of multi-menisci over the surface of a substrate using a single manifold.