The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7454739 B1

PDF
Full Text
Expired
Date of Patent:
Nov. 18, 2008

Filed:

May. 31, 2006
Applicants:

Jensheng Huang, San Jose, CA (US);

Chun-chieh Kuo, Hsinchu, TW;

Lawrence S. Melvin, Iii, Hillsboro, OR (US);

Inventors:

Jensheng Huang, San Jose, CA (US);

Chun-Chieh Kuo, Hsinchu, TW;

Lawrence S. Melvin, III, Hillsboro, OR (US);

Assignee:

Synopsys, Inc., Mountain View, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

One embodiment of the present invention provides a system that determines an accurate process model. During operation, the system receives process data. Next, the system receives an optical model which models an optical system of a photolithography process. The system then determines a stack model using the optical model, wherein the stack model models the effects of the photolithography process on the stack layers. Finally, the system determines a process model using the optical model, the stack model, and the process data.


Find Patent Forward Citations

Huang, Jensheng. (2008). Method and apparatus for determining an accurate photolithography process model (U.S. Patent No. 7454739). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7454739

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