The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2008
Filed:
Dec. 11, 2006
Wenbing Yun, Walnut Creek, CA (US);
Frederick W. Duewer, Albany, CA (US);
Michael Feser, Martinez, CA (US);
Andrei Tkachuk, Walnut Creek, CA (US);
Srivatsan Seshadri, Walnut Creek, CA (US);
Wenbing Yun, Walnut Creek, CA (US);
Frederick W. Duewer, Albany, CA (US);
Michael Feser, Martinez, CA (US);
Andrei Tkachuk, Walnut Creek, CA (US);
Srivatsan Seshadri, Walnut Creek, CA (US);
Xradia, Inc., Concord, CA (US);
Abstract
An x-ray source comprises a structured anode that has a thin top layer made of the desired target material and a thick bottom layer made of low atomic number and low density materials with good thermal properties. In one example, the anode comprises a layer of copper with an optimal thickness deposited on a layer of beryllium or diamond substrate. This structured target design allows for the use of efficient high energy electrons for generation of characteristic x-rays per unit energy deposited in the top layer and the use of the bottom layer as a thermal sink. This anode design can be applied to substantially increase the brightness of stationary, rotating anode or other electron bombardment-based sources where brightness is defined as number of x-rays per unit area and unit solid angle emitted by a source and is a key figure of merit parameter for a source.