The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 28, 2008
Filed:
Feb. 14, 2006
Koen Van Ingen Schenau, Veldhoven, NL;
Maurice Henricus Franciscus Janssen, Eindhoven, NL;
Antoine Gaston Marie Kiers, Veldhoven, NL;
Hans Van Der Laan, Veldhoven, NL;
Peter Clement Paul Vanoppen, Hechtel-Eksel, BE;
Koen Van Ingen Schenau, Veldhoven, NL;
Maurice Henricus Franciscus Janssen, Eindhoven, NL;
Antoine Gaston Marie Kiers, Veldhoven, NL;
Hans Van Der Laan, Veldhoven, NL;
Peter Clement Paul Vanoppen, Hechtel-Eksel, BE;
ASML Netherlands B.V., Veldhoven, NL;
Abstract
A lithographic apparatus includes an illuminator configured to condition a beam of radiation and a support configured to hold a patterning device. The patterning device is configured to pattern the beam of radiation according to a desired pattern. The lithographic apparatus also includes a substrate table configured to hold a substrate and a projection system configured to project the patterned beam onto a target portion of the substrate to form a patterned image on the substrate. The apparatus further includes a sensor configured and arranged to intercept a portion of the beam and to measure a transmission of the beam through at least a portion of the patterning device.