The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 14, 2008

Filed:

Nov. 09, 2005
Applicant:

Jung-wu Chien, Hsinchu County, TW;

Inventor:

Jung-Wu Chien, Hsinchu County, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/336 (2006.01);
U.S. Cl.
CPC ...
Abstract

A dynamic random access memory (DRAM) includes a substrate, an active device and a deep trench capacitor. A trench and a deep trench are formed in the substrate. The active device is disposed on the substrate. The active device includes a gate structure and a doped region. The gate structure is disposed on the substrate and fills the trench. The doped region is disposed in the substrate at a first side of the gate structure. The deep trench capacitor is disposed in the deep trench of the substrate at a second side of the gate, and the second side is opposite to the first side. In addition, an upper electrode of the deep trench capacitor is adjacent to the bottom of the trench.


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