The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 16, 2008
Filed:
Aug. 13, 2003
C. Robert Koemtzopoulos, Castro Valley, CA (US);
Shibu Gangadharan, Fremont, CA (US);
Chris G. N. Lee, Kensington, CA (US);
Alan Miller, Moraga, CA (US);
C. Robert Koemtzopoulos, Castro Valley, CA (US);
Shibu Gangadharan, Fremont, CA (US);
Chris G. N. Lee, Kensington, CA (US);
Alan Miller, Moraga, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
Broadly speaking, methods and an apparatus are provided for removing an inorganic material from a substrate. More specifically, the methods provide for removing the inorganic material from the substrate through exposure to a high density plasma generated using an inductively coupled etching apparatus. The high density plasma is set and controlled to isotropically contact particular regions of the inorganic material to allow for trimming and control of a critical dimension associated with the inorganic material.